最新消息

日本 ARCUS 藝術家駐村計畫徵件

最新消息分類: 
駐村
Tag: 
Tag: 
Tag: 

Call for applications for ARCUS project 2012 IBARAKI ARTIST-IN-RESIDENCE PROGRAMME, Japan. Open to emerging contemporary and visual artists, interested in process-based, community collaborative work.

Artist-in-residence program of ARCUS Project which aims to support the artistic activities of emerging artists was launched in 1994 by Ibaraki Prefectural Government as its main organizer. In its 18 years history, ARCUS Project has invited 82 artists from 26 countries / regions, and supported their artistic projects and researches during the residence. A number of previous residency artists are now known as cutting- edge artists in international art scene.

Since the year 2010, ARCUS Project artist-in-residence program has focused more on the “process” of activities. Therefore, we are looking for a project which does not regard final presentation as a goal, but tries to conduct a site-specific research / project within a certain period of time. It is also expected that the research / project is open to the local community for sharing the process and collaboration. The proposed projects are supposed to be temporary works with which the applied area can be returned to its original state. Since our program is aimed at promoting international exchanges, applicants should possess national of a country other than Japan. Not more than one artist will be selected from one country / region.

ELIGIBILITY
The Applicant should:

— be an emerging artist engaged in contemporary visual arts or other related fields
— have nationality of country other than Japan
— have legal permission to enter Japan
— be in a state of good health and able to carry out daily activities on his / her own
— have enough English skill to communicate with other artists, coordinators and curator.
— not be enrolled in educational institution (undergraduate, graduate school etc.) during the residency period

PERIOD OF PROGRAM
3 month residency period. End-August through November, 2012

Application Deadline is April 30, 2012.

Both online and postal applications should be submitted by this date. For postal application, the material postmark dated April 30 is NOT valid.

For full guidelines and online application form, see website.

Read the feedback of 2011 ARCUS residency artists.

相關專案: 
本系統已提升網路傳輸加密等級,IE8及以下版本將無法支援。為維護網路交易安全性,請升級或更換至右列其他瀏覽器。